Dec 17, 2007 3:30 pm EST KLA-Tencor Extends Metrology Portfolio With SensArray Etch Measurement Suite
Dec 07, 2007 3:30 pm EST KLA-Tencor and Nikon Develop Automated Overlay Correction Tools for Cost-Effective Mix & Match 45nm Lithography
Dec 02, 2007 11:15 pm EST KLA-Tencor's New Aleris 8500 Film Metrology System is Industry's Most Advanced Thickness and Composition Measurement Technology for 45nm and Beyond
Dec 02, 2007 11:15 pm EST KLA-Tencor Introduces Complete Measurement Solution for Critical 45nm Wafer Geometry Metrology Requirements
Nov 08, 2007 9:15 am EST KLA-Tencor Declares Regular Cash Dividend for Second Quarter Fiscal Year 2008
